Atomschichtabscheidung: Prinzipien, Eigenschaften und Nanotechnologie-App...
195,12 €
Usually the goal is to deposit many layers on top of each other. There are many variations on this process. Th is broken down by material to be deposited as a monolayer. There is a chapter on semiconductor films such as gallium arsenide and precursors used to facilitate deposition.
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![Produktbild - Atomic Layer Deposition for Semiconductors by Cheol Seong Hwang [Paperback]](https://i.ebayimg.com/thumbs/images/g/U~EAAeSw1KhoPaWI/s-l140.jpg)
