Design for Manufacturability With Advanced Lithography, Hardcover by Yu, Bei;...
Design for Manufacturability With Advanced Lithography, Hardcover by Yu, Bei; Pan, David Z., ISBN 3319203843, ISBN-13 9783319203843, Like New Used, Free shipping in the US This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unliks that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
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