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Physical and Technical Problems of SOI Structures and Devices: Proceedings of th

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SOI materials: Low dose SIMOX for ULSI applications; A.J. Auberton-Herve, et al. Why porous silicon for SOI?. V.P. Bondarenko, A.M. Dorofeev. Ion beam processing for SOI; W. Skorupa. Semi-insulating oxygen-doped silicon by low temperature chemical vapor deposition for SOI applications; J.C. Sturm, et al.

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ISBN-13:

9780792336006
Book Title:

Physical and Technical Problems of SOI Structures and Devices
ISBN:

9780792336006

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